Electronic scrubber
Industrial process often generates large amount of exhausts gases, containing different gaseous air pollutants that are hazardous , toxic and odorous in nature and should be effectively treated well before venting it to atmosphere as per pollution control Board norms.
Apzem Dry scrubber system utilizes dry adsorption techniques to separate pollutant acid gases from exhaust air stream. Apzem has been custom designing its range of dry scrubber for various customers across different industries. The selection and customization, is hugely depends on exhaust gas temperature, its constituents, corrosive nature, pollution loading, their absorption or adsorption nature, moisture contents etc.
Apzem provides complete customization of its entire range of scrubbers. Choose any of our wet scrubber types below or call us @ +91-044-26580258 or send us enquiry to enquiry@apzem.com. We are very much happy to assist you in selecting and customizing our widest range of wetscrubber system that best suits your needs and fits within your budget.
Products
Ion implant scrubber
Ion implant scrubberA dry scrubber use catalyst to remove toxic components by chemical adsorption on the surface. The adsorption does not depend on pollutant concentration and contact time, adsorption will take place in very short period of time. When the pollutants adsorbed on to the surface, the catalyst will convert the simple chemicals which is non-toxic and can be disposed of easily. The catalyst is to be replaced frequently when it saturated with pollutants. Optional sensor will be provided for indication of catalyst saturation.
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CVD Scrubbercvd scrubber
Deposition by chemical reaction between reactants. It is a chemical process that deposits thin film of diverse chemical substances. A substrate is exposed to volatile precursors and react to generate required deposit. Simultaneously, the byproducts also generated from the process. Precursors used to deposit silicon is silane (SiH4).
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Metal Etch ScrubberMeta Etch Scrubber
Traditionally etching was performed by hand. It was implemented by using sharp tipped tool to etch metal according to desired design pattern. This process is time consumable. Nowadays the most popular metal etching is acid etching as the chemical technology has improved, since chemical milling is much faster than mechanical milling. Metal etching is process of creating design on metal surface using acid or mordant. The most commonly used chemicals are nitric acid, hydrochloric acid, potassium chlorate and Ferric Chloride. These acids will be used in different concentrations.
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MOCVD ScrubberMOCVD (Metal Organic Chemical Vapor Deposition) is a technology used in semiconductor industry, including LEDS, Lasers, Solar cells and field effect transistors. This technology is used to deposit very thin layers of atoms onto a semiconductor wafer. It is the most important manufacturing MOCVD process for III – V semiconductors, especially based on Gallium Nitride (GaN).
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Semiconductor ScrubberThe fast growth in electronic industry has brought new environmental challenges for processes applied in manufacturing of semiconductor chips, which are important key part of many advanced electronic devices.Potentially hazardous chemicals; arsine, silane and phosphine are mainly used in fabrication of semiconductor by chemical vapor deposition (CVD).
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