The fast growth in electronic industry has brought new environmental challenges for processes applied in manufacturing of semiconductor chips, which are important key part of many advanced electronic devices.Potentially hazardous chemicals; arsine, silane and phosphine are mainly used in fabrication of semiconductor by chemical vapor deposition (CVD).

MOCVD (Metal Organic Chemical Vapor Deposition) is a technology used in semiconductor industry, including LEDS, Lasers, Solar cells and field effect transistors. This technology is used to deposit very thin layers of atoms onto a semiconductor wafer. It is the most important manufacturing MOCVD process for III – V semiconductors, especially based on Gallium Nitride (GaN).

Meta Etch Scrubber

                Traditionally etching was performed by hand. It was implemented by using sharp tipped tool to etch metal according to desired design pattern. This process is time consumable. Nowadays the most popular metal etching is acid etching as the chemical technology has improved, since chemical milling is much faster than mechanical milling. Metal etching is process of creating design on metal surface using acid or mordant. The most commonly used chemicals are nitric acid, hydrochloric acid, potassium chlorate and Ferric Chloride. These acids will be used in different concentrations.

cvd scrubber

Deposition by chemical reaction between reactants. It is a chemical process that deposits thin film of diverse chemical substances. A substrate is exposed to volatile precursors and react to generate required deposit. Simultaneously, the byproducts also generated from the process.  Precursors used to deposit silicon is silane (SiH4).